Aktuelles
 

News - Archiv

SPIE Photomask Technology 29th Annual Symposium (BACUS 2009)

14. - 17. September 2009

Dienstag 15.09.2009; Session 6: Nano-Imprint and Patterned Media Technology II

Vortrag von Marcus Pritschow a

High-Resolution E-Beam Repair for Nanoimprint Templates

Harald Dobbersteinb, Klaus Edingerb, Mathias Irmschera, Douglas J. Resnickc, Kosta Selinidisc, Ecron Thompson c, Markus Waiblingerb

a) IMS Chips, Allmandring 30a, D-70569 Stuttgart, Germany

b) Carl Zeiss SMS GmbH, Carl Zeiss Promenade 10, D-07740 Jena, Germany

c) Molecular Imprints, Inc. 1807-C W. Braker Lane, Austin, TX 78758, USA


Poster: Florian Letzkus a

3D Si Aperture Plates combined with programmable Blanking Plates for Multi-Beam Mask Writing

Mathias Irmschera, Michael Jurischa, Elmar Platzgummerb, Christof Kleinb, Hans Loeschnerb

a) IMS Chips, Allmandring 30a, D-70569 Stuttgart, Germany

b) IMS Nanofabrication AG, Schreygasse 3, A-1020 Vienna, Austria


Weitere Informationen finden Sie unter: http://spie.org/photomask.xml

Ort: Monterey Marriott and Monterey Conference Center, CA, USA