Membrans

Si-stencil mask with minimal structures of 200 nm

Si₃N₄-membrane array

Si₃N₄-membrane with structured Cr-absorber

We manufacture membranes made of silicon or silicon nitride in various thicknesses and sizes.

The membranes can be structured whereas the minimal possible opening size depends on the film thickness. For example, we can fabricate 200 nm structures in Si-membranes with a thickness of 3 µm.

In addition, we manufacture membranes with structured absorbers made of chrome, aluminum or titanium.

These components are typically used for apertures or windows for electron, ion, EUV and infrared radiation as well as probe grips for TEM investigations.

Contact

For further information, please contact: Florian Letzkus